Browsing by Subject "Sputtering Deposition"
Now showing items 1-1 of 1
-
(Texas A&M University, 2007-04-25)A novel high-k gate dielectric material, i.e., hafnium-doped tantalum oxide (Hf-doped TaOx), has been studied for the application of the future generation metal-oxidesemiconductor field effect transistor (MOSFET). The ...